Smayling, Michael C.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - 11nm logic lithography with OPC-lite

Lai, Kafai, Erdmann, Andreas, Smayling, Michael C., Tsujita, Koichiro, Yaegashi, Hidetami, Axelrad, Valery, Nakayama, Ryo, Oyama, Kenichi, Hara, Arisa

Year:

2014

Language:

english

File:

PDF, 3.69 MB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Joint-optimization for SRAM and logic for 28nm node and below

Verhaegen, Staf, Rieger, Michael L., Thiele, Joerg, Smayling, Michael C., De Bisschop, Peter, Laenens, Bart

Year:

2010

Language:

english

File:

PDF, 855 KB

english, 2010

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Supreme lithographic performance by simple mask layout based on lithography and layout co-optimization

Tsujita, Koichiro, Arai, Tadashi, Ishii, Hiroyuki, Gyoda, Yuichi, Takahashi, Kazuhiro, Axelrad, Valery, Smayling, Michael C.

Year:

2011

Language:

english

File:

PDF, 1.03 MB

english, 2011

4

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - 1D design style implications for mask making and CEBL

Smayling, Michael C., Faure, Thomas B., Ackmann, Paul W.

Year:

2013

Language:

english

File:

PDF, 680 KB

english, 2013

5

SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Canberra, ACT, Australia (Wednesday 5 December 2007)] Microelectronics: Design, Technology, and Packaging III - SoC variability evaluation and reduction

Balasinski, Artur P., Hariz, Alex J., Varadan, Vijay K., Smayling, Michael C., Axelrad, Valery

Year:

2007

Language:

english

File:

PDF, 465 KB

english, 2007

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - 32nm and below logic patterning using optimized illumination and double patterning

Smayling, Michael C., Levinson, Harry J., Dusa, Mircea V., Axelrad, Valery

Year:

2009

Language:

english

File:

PDF, 501 KB

english, 2009

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Sub-20nm logic lithography optimization with simple OPC and multiple pitch division

Smayling, Michael C., Axelrad, Valery, Tsujita, Koichiro, Yaegashi, Hidetami, Nakayama, Ryo, Oyama, Kenichi, Gyoda, Yuichi, Conley, Will

Year:

2012

Language:

english

File:

PDF, 19.70 MB

english, 2012

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Alternative Lithographic Technologies III - E-beam to complement optical lithography for 1D layouts

Lam, David K., Liu, Enden D., Smayling, Michael C., Prescop, Ted, Herr, Daniel J. C.

Year:

2011

Language:

english

File:

PDF, 702 KB

english, 2011

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - 16nm with 193nm immersion lithography and double exposure

Axelrad, Valery, Smayling, Michael C., Rieger, Michael L., Thiele, Joerg

Year:

2010

Language:

english

File:

PDF, 1.07 MB

english, 2010

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Lithography alternatives meet design style reality: How do they "line" up?

Bencher, Christopher, Cheng, Joy Y., Smayling, Michael C.

Year:

2016

Language:

english

File:

PDF, 366 KB

english, 2016

11

[IEEE 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - San Diego, CA, USA (2009.09.9-2009.09.11)] 2009 International Conference on Simulation of Semiconductor Processes and Devices - Simulation-Based Lithography Optimization for Logic Circuits at 22nm and Below

Smayling, Michael C., Axelrad, Valery

Year:

2009

Language:

english

File:

PDF, 656 KB

english, 2009

12

An analytical method for determining intrinsic drain/source resistance of lightly doped drain (LDD) devices

Charvaka Duvvury, Dave Baglee, Michael Duane, Adin Hyslop, Michael Smayling, Mike Maekawa

Journal:

Solid-State Electronics

Year:

1984

Language:

english

File:

PDF, 549 KB

english, 1984

13

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Coherent multiple imaging by means of pupil plane filtering

Erdelyi, Miklos, Kroyan, Armen, Osvay, Karoly, Bor, Zsolt, Wilson, Jr., William L., Smayling, Michael C., Tittel, Frank K., Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 1.94 MB

english, 1999

14

[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - In Situ Dry Chemical Clean to Improve NiSi and Ni(Pt)Si Integration

Wood, Bingxi S., Lei, Jianxin, Phan, See-Eng, Ninan, Biju, Lavu, Kishore, Smayling, Michael, Kao, Chien-Teh, Gandikota, Srinivas

Year:

2007

Language:

english

File:

PDF, 753 KB

english, 2007

15

Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique

Kido, Motoi, Szabó, Gabor, Cavallaro, Joseph R., Wilson, William L., Smayling, Michael C., Tittel, Frank K.

Journal:

Japanese Journal of Applied Physics

Year:

1995

Language:

english

File:

PDF, 261 KB

english, 1995

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Custom source and mask optimization for 20nm SRAM and logic

Smayling, Michael C., Coskun, Tamer H., Kamat, Vishnu

Year:

2011

Language:

english

File:

PDF, 1.03 MB

english, 2011

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - 7nm logic optical lithography with OPC-Lite

Lai, Kafai, Erdmann, Andreas, Smayling, Michael C., Tsujita, Koichiro, Yaegashi, Hidetami, Axelrad, Valery, Nakayama, Ryo, Oyama, Kenichi, Yamauchi, Shohei, Ishii, Hiroyuki, Mikami, Koji

Year:

2015

Language:

english

File:

PDF, 2.43 MB

english, 2015

18

Tunneling induced charge generation in SiO[sub 2] thin films

Chen, Chun, Wilson, William L., Smayling, Michael

Journal:

Journal of Applied Physics

Year:

1998

Language:

english

File:

PDF, 404 KB

english, 1998

19

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Integrated CAD framework linking VLSI layout editors and process simulators

Sengupta, Chaitali, Erdelyi, Miklos, Bor, Zsolt, Cavallaro, Joseph R., Smayling, Michael C., Szabo, Gabor, Tittel, Frank K., Wilson, Jr., William L., Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 489 KB

english, 1996

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Sub-12nm optical lithography with 4x pitch division and SMO-lite

Smayling, Michael C., Conley, Will, Tsujita, Koichiro, Yaegashi, Hidetami, Axelrad, Valery, Arai, Tadashi, Oyama, Kenichi, Hara, Arisa

Year:

2013

Language:

english

File:

PDF, 2.90 MB

english, 2013

21

SPIE Proceedings [SPIE Gas Flow and Chemical Lasers: Tenth International Symposium - Friedrichshafen, Federal Republic of Germany (Monday 5 September 1994)] Gas Flow and Chemical Lasers: Tenth International Symposium - Interferometric phase shift technique for high-resolution deep-UV microlithography

Tittel, Frank K., Cavallaro, Joseph R., Kido, Motoi, Smayling, Michael C., Szabo, Gabor, Wilson, Jr., William L., Bohn, Willy L., Huegel, Helmut

Year:

1995

Language:

english

File:

PDF, 447 KB

english, 1995

22

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - New interferometric phase-shifting technique for sub-half-micron laser microlithography

Erdelyi, Miklos, Sengupta, Chaitali, Bor, Zsolt, Cavallaro, Joseph R., Kido, Motoi, Smayling, Michael C., Tittel, Frank K., Wilson, Jr., William L., Szabo, Gabor, Brunner, Timothy A.

Year:

1995

Language:

english

File:

PDF, 346 KB

english, 1995

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i

De Bisschop, Peter, Laenens, Bart, Iwase, Kazuya, Yao, Teruyoshi, Dusa, Mircea, Smayling, Michael C.

Year:

2011

Language:

english

File:

PDF, 3.69 MB

english, 2011

24

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Design and Process Integration for Microelectronic Manufacturing II - Manufacturability of the X Architecture at the 90-nm technology node

Smayling, Michael C., Liebmann, Lars W., Sarma, Robin C., Nagata, Toshiyuki, Arora, Narain, Duane, Michael P., Oemardani, Shiany, Shah, Santosh

Year:

2004

Language:

english

File:

PDF, 572 KB

english, 2004

25

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Accelerating yield ramp through design and manufacturing collaboration

Sarma, Robin C., Staud, Wolfgang, Weed, J. Tracy, Dai, Huixiong, Smayling, Michael C., Duane, Michael P.

Year:

2004

Language:

english

File:

PDF, 782 KB

english, 2004

26

Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique

Erdélyi, Miklós, Bor, Zsolt, Wilson, William L., Smayling, Michael C., Tittel, Frank K.

Journal:

Year:

2000

Language:

english

File:

PDF, 3.34 MB

english, 2000

27

SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Pitch-based pattern splitting for 1D layout

Yoshioka, Nobuyuki, Nakayama, Ryo, Ishii, Hiroyuki, Mikami, Koji, Tsujita, Koichiro, Yaegashi, Hidetami, Oyama, Kenichi, Smayling, Michael C., Axelrad, Valery

Year:

2015

Language:

english

File:

PDF, 420 KB

english, 2015

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - 22nm logic lithography in the presence of local interconnect

Smayling, Michael C., Socha, Robert J., Dusa, Mircea V., Dusa, Mircea V., Conley, Will

Year:

2010

Language:

english

File:

PDF, 1.53 MB

english, 2010

29

SPIE Proceedings [SPIE International Conference on Atomic and Molecular Pulsed Lasers - Tomsk, Russia (Monday 22 September 1997)] International Conference on Atomic and Molecular Pulsed Lasers II - Present and future trends in excimer-laser-based microlithography

Tittel, Frank K., Erdelyi, Miklos, Horvath, Zoltan L., Kroyan, Armen, Wilson, Jr., William L., Smayling, Michael C., Bor, Zsolt, Szabo, Gabor, Tarasenko, Victor F., Mayer, Georgy V., Petrash, Gueorgii

Year:

1998

Language:

english

File:

PDF, 1.10 MB

english, 1998

30

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Optical microlithography with nearly nondiffracting beams

Erdelyi, Miklos, Horvath, Zoltan L., Bor, Zsolt, Szabo, Gabor, Cavallaro, Joseph R., Smayling, Michael C., Tittel, Frank K., Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 847 KB

english, 1997

31

SPIE Proceedings [SPIE XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference - Edinburgh, United Kingdom (Sunday 25 August 1996)] XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference - High-resolution microlithography applications of deep-UV excimer lasers

Tittel, Frank K., Cavallaro, Joseph R., Erdelyi, Miklos, Szabo, Gabor, Bor, Zsolt, Smayling, Michael C., Hall, Denis R., Baker, Howard J.

Year:

1997

Language:

english

File:

PDF, 226 KB

english, 1997

32

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Design and Process Integration for Microelectronic Manufacturing II - Taking the X Architecture to the 65-nm technology node

Sarma, Robin C., Liebmann, Lars W., Smayling, Michael C., Arora, Narain, Nagata, Toshiyuki, Duane, Michael P., Shah, Santosh, Keston, Harris J., Oemardani, Shiany

Year:

2004

Language:

english

File:

PDF, 274 KB

english, 2004

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - APF pitch-halving for 22nm logic cells using gridded design rules

Smayling, Michael C., Singh, Vivek K., Rieger, Michael L., Bencher, Christopher, Chen, Hao D., Dai, Huixiong, Duane, Michael P.

Year:

2008

Language:

english

File:

PDF, 619 KB

english, 2008

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Interference assisted lithography for patterning of 1D gridded design

Greenway, Robert T., Hendel, Rudolf, Jeong, Kwangok, Kahng, Andrew B., Petersen, John S., Rao, Zhilong, Smayling, Michael C., Schellenberg, Frank M., La Fontaine, Bruno M.

Year:

2009

Language:

english

File:

PDF, 968 KB

english, 2009

35

VLSI CMOS technology for low power sensor applications

Michael C. Smayling

Journal:

Solid State Ionics

Year:

1989

Language:

english

File:

PDF, 456 KB

english, 1989

36

Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination

Erdélyi, Miklós, Bor, Zsolt, Cavallaro, Joseph R., Szabó, Gabor, Wilson, William L., Sengupta, Chaitali, Smayling, Michael C., Tittel, Frank K.

Journal:

Japanese Journal of Applied Physics

Year:

1995

File:

PDF, 575 KB

1995

37

SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Enhanced microlithography using coherent multiple imaging

Erdelyi, Miklos, Osvay, Karoly, Bor, Zsolt, Wilson, Jr., William L., Smayling, Michael C., Tittel, Frank K., Mack, Chris A., Stevenson, Tom

Year:

1999

Language:

english

File:

PDF, 3.33 MB

english, 1999

38

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Low k1 logic design using gridded design rules

Smayling, Michael C., Liu, Hua-yu, Cai, Lynn, Singh, Vivek K., Rieger, Michael L.

Year:

2008

Language:

english

File:

PDF, 226 KB

english, 2008

39

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Improvement of lithographic performance and reduction of mask cost by simple OPC

Tsujita, Koichiro, Abboud, Frank E., Faure, Thomas B., Mikami, Koji, Ishii, Hiroyuki, Arai, Tadashi, Nakayama, Ryo, Smayling, Michael C., Axelrad, Valery, Yaegashi, Hidetami, Oyama, Kenichi

Year:

2012

Language:

english

File:

PDF, 2.63 MB

english, 2012

40

SPIE Proceedings [SPIE Photonics West '95 - San Jose, CA (Wednesday 1 February 1995)] UV and Visible Lasers and Laser Crystal Growth - New phase-shifting technique for deep UV excimer laser based lithography

Bor, Zsolt, Cavallaro, Joseph R., Erdelyi, Miklos, Kido, Motoi, Sengupta, Chaitali, Smayling, Michael C., Szabo, Gabor, Tittel, Frank K., Wilson, Jr., William L., Scheps, Richard, Kokta, Milan R.

Year:

1995

Language:

english

File:

PDF, 716 KB

english, 1995

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